“Transistor characteristics in advanced technology nodes are strongly impacted by devices design and process integration choices. Variation in the layout and pattern configuration in close proximity ...
The critical role of mechanical stress in FinFET performance and the importance of pitch control to minimize variability and optimize device parametric targets.
GlobalFoundries today accelerated its roadmap with the launch of a new technology designed for the expanding mobile market. The company’s 14nm-XM offering will give customers the performance and power ...
Low power design has become a cornerstone of modern integrated circuit development, driven by energy efficiency demands and the challenges of scaling in nanometre technologies. Innovations in ...
Taiwan Semiconductor Manufacturing Company (TSMC) may be showing off its vision for the future of chip manufacturing technologies beyond 20 nanometers when it unveils its latest research into FinFET ...
Artificial intelligence (AI) has become the workload that defines today’s semiconductor scaling. Whether in hyperscale data centers training foundation models or at the network edge executing ...
Samsung has been hit with a $400M fine for failing to license a critical FinFET patent -- and that damage could balloon up to $1.2B at the judge's discretion. Share on Facebook (opens in a new window) ...
Some results have been hidden because they may be inaccessible to you
Show inaccessible results